We have an EVG610 Mask Alignment system with Mask Holders for 4 in and 5 in wafers.
- Alignment modes:
Top side CCD: Up to ± 0.5 µ m / 3 σ - Stage:
Precision micrometers: Manual
Contact force: Adjustable 5N – 80N - Resolution
Vacuum + Hard Contact ≤ 0.8 µm
Hard Contact ≤ 1.5 µm
Soft Contact ≤ 2.0 µm
Proximity ≥ 3.0 µm
Wave length: 350-450 nm (NUV, default); optional: down to 200 nm (DUV)
Mercury arc lamp: 350 W, 500 W
Tool Owner: Bruno