Mask Aligner

We have an EVG610 Mask Alignment system with Mask Holders for 4 in and 5 in wafers.

  • Alignment modes:
    Top side CCD: Up to  ± 0.5 µ m / 3 σ
  • Stage:
    Precision micrometers: Manual
    Contact force: Adjustable 5N – 80N
  • Resolution 
    Vacuum + Hard Contact  ≤ 0.8 µm
    Hard Contact  ≤ 1.5 µm
    Soft Contact  ≤ 2.0 µm
    Proximity  ≥  3.0 µm
    Wave length: 350-450 nm (NUV, default); optional: down to 200 nm (DUV)
    Mercury arc lamp: 350 W, 500 W

Tool Owner: Jack Merrin

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