We have two Oxford Instruments ICP etchers. We can etch several semiconductor materials using Fluorine or Chlorine chemistries:
a) ICP F (SF6, C4F8, O2, Ar, CHF3, CF4)
b) ICP Cl(BCl3, Cl2, SF6, O2, Ar, C4F8, CHF3)
![](http://nff.pages.ist.ac.at/wp-content/uploads/sites/97/2018/10/591A6577-Bearbeitet-300x200.jpg)
![](http://nff.pages.ist.ac.at/wp-content/uploads/sites/97/2018/10/FER2417-300x200.jpg)
Tool Owner: J. Aguilera (ICP-Cl), R. Previdi (ICP-F)