ICP Etching

We have two Oxford Instruments ICP etchers. We can etch several semiconductor materials using Fluorine or Chlorine chemistries:

a) ICP F (SF6, C4F8, O2, Ar, CHF3, CF4)

b) ICP Cl(BCl3, Cl2, SF6, O2, Ar, C4F8, CHF3)

Tool Owner: J. Aguilera

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