OurĀ e-beam lithography system is a RAITH EBPG5150. An e-beam lithography system uses a beam of electrons that is scanned across a surface containing resist. The beam of electrons breaks the chemical bonds of the exposed resist. By scanning the beam across particular areas, we can define a pattern in the resist.
Our tool features:
- High current density Thermal Field Emission gun for operation at 50 and 100 kV
- Rapid exposure with a 100 MHz pattern generator
- Minimum feature size of less than 8 nm
![](http://nff.pages.ist.ac.at/wp-content/uploads/sites/97/2018/10/FER2731-300x200.jpg)
![](http://nff.pages.ist.ac.at/wp-content/uploads/sites/97/2018/10/FER2759-300x200.jpg)
Tool Owner: Salvatore Bagiante