E-beam lithography

OurĀ e-beam lithography system is a RAITH EBPG5150. An e-beam lithography system uses a beam of electrons that is scanned across a surface containing resist. The beam of electrons breaks the chemical bonds of the exposed resist. By scanning the beam across particular areas, we can define a pattern in the resist.

Our tool features:

  • High current density Thermal Field Emission gun for operation at 50 and 100 kV
  • Rapid exposure with a 100 MHz pattern generator
  • Minimum feature size of less than 8 nm

Available Resists

Tool Owner: Salvatore Bagiante

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