Our e-beam lithography system is a RAITH EBPG5150. An e-beam lithography system uses a beam of electrons that is scanned across a surface containing resist. The beam of electrons breaks the chemical bonds of the exposed resist. By scanning the beam across particular areas, we can define a pattern in the resist.
Our tool features:
- High current density Thermal Field Emission gun for operation at 50 and 100 kV
- Rapid exposure with a 100 MHz pattern generator
- Minimum feature size of less than 8 nm
Tool Owner: Salvatore Bagiante